The Institute for Electronics and Nanotechnology has a state-of-the-art cleanroom, offering a broad range of fabrication and characterization capabilities for activities from basic discovery to prototype realization. Learn more about some of the tools below.
The BMF microArch S140 is the ideal solution for researchers requiring ultra-high resolution, accuracy, and precision in a desktop micro 3D printer. The microArch has a large build volume (94x52x45mm) and the ability to print with engineering-grade materials (photosensitive resins) to meet the needs of industrial production and quality. With an optical resolution of 10μm and layer thickness of 10-40μm, the S140 can produce surface finishes of 0.4 - 0.8μm Ra (top) and 1.5 - 2.5μm Ra (side).
BMF microArch is the first commercialized high-resolution, 3D microfabrication equipment based on PμSL technology. Projection Micro Stereolithography allows for rapid photopolymerization of a layer of liquid polyer using a flash of UV-LED at micro-scale resolution.
Experience the fast and easy production of microstructures by importing your STL file and exposing your design directly to accelerate your work in the areas of microfluidics, MEMS, filtration, electronics, medical devices, and other applications that require microstructures.
The IEN cleanroom has finished upgrading the Heidelberg MLA 150 #2 maskless aligner. The 405nm laser has been added to the equipment which has enabled the tool to work on more photoresists. More… More »
The Georgia Tech AJA Nitride Multisource Sputtering System deposits thin metal and nitride films in argon and nitrogen-enriched low vacuum. The AJA Sputterer has 4 magnetron sputtering guns, 2 DC… More »
The FlexAL atomic layer deposition (ALD) system offers a broad range of optimized high-quality plasma ALD and thermal ALD processes with maximum flexibility in precursors, processes gases, and… More »
The Veeco Fiji G2 Atomic Layer Deposition (ALD) System is a modular, high-vacuum ALD system that can accommodate a wide range of deposition modes using a flexible architecture and multiple… More »
The Georgia Tech Black Magic PECVD is Plasma-Enhanced Chemical Vapor Deposition (PECVD) equipment for deposition of high-quality carbon nanotube (CNT), carbon nanoribbon (CNR) and graphene thin… More »
The Georgia Tech Heidelberg MLA150 has been specifically designed for easy operation and includes all our know-how on developing maskless lithography systems that we have… More »
The Keyence VK-X3000 3D Surface Profiler, which performs non-contact profile, roughness, and film thickness measurements with nanometer-level resolution on any material or shape. Unlike other 3D… More »
This month we are highlighting the Optec Femtosecond Laser Micromachining System, which is located in the Pettit Building in lab 148. The Georgia Tech Optec Femtosecond laser is an OPTEC WS-Flex… More »
This month we are focusing on the\ upgraded capabilities of our Nanoscribe (located in the Marcus Biocleanroom). A major challenge is when we scale up to a usable part size in the micron scale, we… More »
