The Institute for Electronics and Nanotechnology has a state-of-the-art cleanroom, offering a broad range of fabrication and characterization capabilities for activities from basic discovery to prototype realization. Learn more about some of the tools below.
This month’s highlight is the Heidelberg MLA 300, located in the Marcus Inorganic cleanroom. This popular tool has a system designed for easy operation to develop maskless lithography systems. The Heidelberg MLA streamlines prototyping cycles and achieves the highest optical quality and precision. It uses a light to expose many types of photoresists including thicker and harder to reach layers.
The Maskless Aligner MLA 300 provides high throughput, a simplified workflow, and integration with manufacturing execution systems. With a minimum feature size of 1.5 um, the MLA 300 can expose up to 12" wafer sizes. Real-time autofocus compensates for substrate warp or corrugations, ensuring flawless patterning. Shorter time writing for utilizing the tool from prototyping to production, with superior critical dimensions (CD) uniformity.
, 
This month’s highlight is the Exaddon Ceres Metal 3D printing system, located in the Marcus Biocleanroom! Exaddon’s CERES μAM system prints microscale metal objects by electrodeposition. The… More »
, 
This month we are featuring a brand-new piece of equipment, the OPTEC LSV-Flex Micro-machining laser system located in Pettit room 102B! This new laser tool can pulse through materials such as… More »
The Heidelberg MLA 150 #2, located in the Marcus Inorganic cleanroom. This popular tool has a system designed for easy operation to develop maskless lithography systems. The Heidelberg MLA… More »
The Georgia Tech Optec Femtosecond Laser is an OPTEC WS-Flex USP system that uses a femtosecond laser to process practically any material through ultra-short laser pulses photo-ablation. The ultra… More »
Exaddon’s CERES μAM system prints microscale metal objects by electrodeposition. The system is optimized for printing free-standing microscale structures such as pillars, needles, coils, and… More »
The Maskless Aligner MLA 300 provides high throughput, a simplified workflow, and integration with manufacturing execution systems. With a minimum feature size of 1.5 um, the MLA 300 can expose… More »
The BMF microArch S140 is the ideal solution for researchers requiring ultra-high resolution, accuracy, and precision in a desktop micro 3D printer. The microArch has a large build volume (… More »
The IEN cleanroom has finished upgrading the Heidelberg MLA 150 #2 maskless aligner. The 405nm laser has been added to the equipment which has enabled the tool to work on more photoresists. More… More »
The Georgia Tech AJA Nitride Multisource Sputtering System deposits thin metal and nitride films in argon and nitrogen-enriched low vacuum. The AJA Sputterer has 4 magnetron sputtering guns, 2 DC… More »
The FlexAL atomic layer deposition (ALD) system offers a broad range of optimized high-quality plasma ALD and thermal ALD processes with maximum flexibility in precursors, processes gases, and… More »
The Veeco Fiji G2 Atomic Layer Deposition (ALD) System is a modular, high-vacuum ALD system that can accommodate a wide range of deposition modes using a flexible architecture and multiple… More »
