The Georgia Tech Black Magic PECVD is Plasma-Enhanced Chemical Vapor Deposition (PECVD) equipment for deposition of high-quality carbon nanotube (CNT), carbon nanoribbon (CNR) and graphene thin films. The system can be used to grow both single-walled or multi-walled CNTs depending on the process parameters. In addition, the system can be used for relatively low temperature deposition processes.

The system is capable of accommodating substrates up to 4” in diameter, typically silicon wafers, that must be able to withstand the temperatures specified. Many recipes are saved on the tool for a variety of growth processes including recipes for CNT supergrowth which allows rapid growth of CNTs on the substrate. Depending on the desired material properties and processing parameters, the growth process may be completed in a few minutes. CNTs can easily reach microns in length and have even been grown longer than a millimeter with some recipes.