This month’s highlight is the Heidelberg MLA 300, located in the Marcus Inorganic cleanroom. This popular tool has a system designed for easy operation to develop maskless lithography systems. The Heidelberg MLA streamlines prototyping cycles and achieves the highest optical quality and precision. It uses a light to expose many types of photoresists including thicker and harder to reach layers. 

The Maskless Aligner MLA 300 provides high throughput, a simplified workflow, and integration with manufacturing execution systems. With a minimum feature size of 1.5 um, the MLA 300 can expose up to 12" wafer sizes. Real-time autofocus compensates for substrate warp or corrugations, ensuring flawless patterning. Shorter time writing for utilizing the tool from prototyping to production, with superior critical dimensions (CD) uniformity.