The Heidelberg MLA 150 #2, located in the Marcus Inorganic cleanroom. This popular tool has a system designed for easy operation to develop maskless lithography systems. The Heidelberg MLA streamlines prototyping cycles by allowing patterns to be exposed directly and offers topside alignment. It uses a light to expose many types of photoresists including thicker and harder to reach layers. 

The MLA 150 #2 stands out due to its high exposure speed, accommodates any size and shape, and has flexible pattern changes.  It can expose an area of 100 x 100mm2 with structures as small as 0.6um and an alignment accuracy of 500nm between layers.  This tool can support two wavelengths of 375nm and 405nm, a substrate minimum size of 1.5cm x 1.5cm and perform topside alignment. We hope this tool will greatly aid researchers who are working in the areas of Life Science, MEMS, Micro-Optics, Semiconductor, and other applications.