The IEN cleanroom has finished upgrading the Heidelberg MLA 150 #2 maskless aligner. The 405nm laser has been added to the equipment which has enabled the tool to work on more photoresists. More importantly, the resolution of the equipment has been upgraded to 0.6um which gives the tool superior advantages in sub-micron photolithography. This upgrade has given IEN cleanroom users more flexibility in processing challenging projects that require high resolution.